Surface technology questions and answers (a.s 2019/2020)
1. What is free mean path? Considerations of used pressure levels and
deposition methods.
The mean free path () is the average distance travelled by the gas molecules between
collisions
k T
is the Boltzmann constant, is the absolute temperature, is the cross section for the
P -3
collision and is the gas pressure. At pressure below 10 mbar, is so large that
molecules typically collide only with the walls of the vacuum chamber.
Higher is the P and higher will be the number of collisions between the molecules in the
atmosphere, usually if we want to have a controlled deposition we have to avoid this
phenomenon because for every collision we have the loss of E with a low efficiency for
the process. The most part of the deposition methods use low values of P, all the PVD
processes (vacuum evaporation, sputtering deposition, cathodic arc, ion beam deposition
-3 -6
etc) use high vacuum (10 -10 mbar). There are some techniques which perform in
atmospheric condition of P 1mbar-1 bar (atmospheric pressure plasma jets), but is good
to figure out that these techniques usually are used as a complementary option to low P
plasmas systems.
2. Vacuum gauges (especially high vacuum one)
There are 3 distinct devices most used:
Capacitance Vacuum gauge, -5
1) which operates in the range of atmospheric P – 10
mbar. Direct measure of the pressure using a metallic diaphragm and an
-7
electrode(capacitor) with an reference pressure 10 mbar.
Pirani vacuum -4
2) gauge used for relatively low P values (10 -1 bar) heated filament,
it measures the current and so the change in the Resistance of the wire at the
current passage and associate it with the P, it is possible only for low values of the
Kn number (0,01-10) because for this range the rate of heat transfer is prop to the
P. it need to be calibrated with direct meausure since gases have different heat
transfer coeff.
Ionization vacuum gauges -2
3) are used in high and ultrahigh vacuum regimes (10 to
-10
10 mbar), gas molecules are ionized through electrons and the ion current
formed in the chamber are attracted by a grid anode and passing through it they
are collected by a collector. Here the current found out is linked to the presence of
the gas molecule and so to the effective P inside the chamber. There are 2 types of
ionization vacuum: cold cathode, the e- are emitted by a high voltage (3kV) applied
between 2 electrodes, and the hot cathode where the e- are emitted by the
thermionic effect.
3. How do I create vacuum, why using two pumps? example with two choice
pumps and explain them.
I create vacuum taking a well isolated chamber and taking out all the air/gas
molecules, as much as possible when we arrive at the ultimate P, typical for any kind
of pump and chamber condition. As long as is very difficult to reach very high values
of vacuum we can use 2 pumps, one for reaching the medium-vacuum (usually
mechanical pumps) and one to reach the high-vacuum (diffusion and turbomolecular).
One choice of 2 pumps could be using the Rotary pump together with a diffusion
pump.
The rotary pump is considered mechanical pump because it isolate a small quantity of
gas from the system, compress and discharge it to the atmosphere using a rotation
system with a piston or a vane, which transport the gas without letting it turn back.
The diffusion pump utilizes a vapor jet to increase the momentum to the gas
molecules and force them to pump outlet (connected with a mechanical
forepump).This kind of pump utilizes an oil as vaporized material for the jet, this is
carried out in the pump chamber through multistage nozzles. The vapor jet collides
the residual gas molecules, which are driven toward the bottom of the pump and
compressed at the exit. The biggest problem for this kind of pump is the back-
streaming of the oil in the chamber, cold baffles are used to avoid this phenomenon
(cooled by liquid N ).
2
4. Why we sometimes need vacuum and how do we create it (all the pumps).
The vacuum is required usually for many deposition techniques in order to avoid the
presence of contaminants gases in the atmosphere, so in this way we have a very
clean working environment, and to have a very controlled deposition from the point of
view of the time and deposition rate. Because we are working on the mean path of the
particles and on the possible collisions which can take place. Higher is the P and lower
will be the mean path of the particles, this will lead to have more collisions between
particles so a higher E dispersion (=scattering phenomenon).
We can use different pumps to create vacuum in a hermetic chamber:
1) Rotary pumps
2) Turbomolecular pumps
As the rotary pumps can be considered mechanical pumps, they use many rotors
mounted in series, each one is made by many blades with different inclination. The rotor
speed is very high, on the range of 24 000 to 90 000 rpm. The gas captures in the upper
stages is transferred to the lower one, in this way all the gas is compressed and taken
out. The compression ratio of a single stage increases exponentially with the product of
(Vb)
the tangential rotor speed and square root of the molecular weight of the gas and
s/b.
also depends on the angle and the ratio The compression ratios are important
because the ultimate pressure is determined by the compression ratio for light gases and
9 3
by the amount of outgassing. (N2 and H2 are 10 and 10 ) Molecular flow must prevail in
the pump(avoid losing momentum transferred by the blades), the pumping speed is
weakly dependent on the molecular mass of the pumped gas, because of the
compensating effect given by higher arrival rate (conductance) of light gases.
3) Diffusion pumps
4) Cryogenic pumps
Cryogenic pumps are capable of creating very clean vacuum in the high-vacuum or
ultrahigh-vacuum range. These pumps rely on the condensation or adsorption of vapor
molecules on surfaces cooled below 120 K. Pump surfaces are cooled by liquid N2 (77 K),
He gas refrigerators or liquid He (4.2 K). In two-stage pumps, the first stage (warmer)
condenses H2O (and CO2) and thermally shields the second stage (colder). An initial low
pressure is required, in order to reduce the thermal load on the refrigerant and to avoid
the accumulation of a thick ice layer on the cryopanels. All gases, except He, condense to
form a solid phase at sufficiently low temperatures (cryocondensation). A temperature of
20 K is low enough to achieve UHV conditions with all gases, except He, Ne and H . The
2
effectiveness of a cryopump is increased very significantly by cryosorption: a gas is
adsorbed on a cooled solid at temperatures even higher than the boiling point of the gas
itself. Adsorbants with high surface area, like activated charcoal or molecular sieves, are
so commonly used.
5. How and why do we regenerate cryopumps.
Regeneration of a cryopump is the process of evaporating the trapped gases. During a
regeneration cycle, the cryopump is warmed to room temperature or higher, allowing
trapped gases to change from a solid state to a gaseous state and thereby be released
from the cryopump through a pressure relief valve into the atmosphere. Most production
equipment utilizing a cryopump have a means to isolate the cryopump from the vacuum
chamber, so regeneration takes place without exposing the vacuum system to released
gasses such as water vapor.
6. Why high vacuum pumps also need a forepump?
The forepump is an auxiliary used by a vacuum pump to be more effective, it supplies a
first stage of exhaustion. In the case of the diffusion pump it helps the compressed gas at
the end to be ejected and avoid the hot oil to be stopped in front (or close) to the nozzle.
In order to push gas molecules towards the lower section of the pump, we need a
sufficiently long mean free path, so we must reduce the pressure, that mean that we
need a preliminary pump. This is the region for which we can’t use diffusion pumps at
atmospheric pressure. Also in the case of cyropumps a forepump is required in order to
have already a low P, otherwise we lose efficiency creating a too thick layer on the wall of
the pump or resulting in doing too many cycles(high time and costs)
6. Why turbomolecular pumps are preferred over diffusion ones, even
though the latter have no moving parts?
Because we can achieve the same values of vacuum but in the case of the
turbomolecular we don’t have the problem of the backstreaming of the oil in the
chamber, this could be a very difficult passage for us because is difficult to obtain a clean
environment of working.
7. Vacuum pumps: all + focus on cryopumps work between liquid N2 and
liquid He.
N2 arrives at 77K(removing H2O and CO2) while liquid He can reach 4,2 K(removing H2
and other gases). The T which has to be reached in order to achieve UHV with almost all
the gasses is 20K, but this value could be increased in the case of the cryosoprtion
( when we have adsorbants on the surface).
8. Why we use high rpm in turbomolecular pumps?
Because this type of pumps give to the gas molecules a high velocity by a momentum
transfer from a fast-moving solid surface, which are the blades of the rotors. The normal
speed goes from 24000 to 90000 rpm. The compression ratio of every single stage
increases exponentially with the tangential rotor speed. The stator is needed to reduce
velocity molecule and let the second rotor to be more efficient.
9. Compression ratio and molecular weight relation.
Compression ratio = ratio of molecules leaving /entering the rotor
When the molecular weight is low the molecules have higher velocities, so they can pass
through the rotor without getting compressed to other rotor, so the compression ratio is
smaller for them. If compression ratio is high the pump works efficiently, if it's small the
energy is not utilized properly so, we say pumping process is not efficient. So if molecules
have low molecular weight pump should run at low rmp. If molecules have higher
molecular weight then pump should run at higher rpm (to push away the molecules to
next rotors pump needs more speed) and to maintain the efficiency of the pump.
10. How to reach high vacuum pressures?
First rotary pump (or another forepump), then another pump can be used in order to
achieve better performance as the turbomolecular pumps/cryopumps. Another
alternative to be used in replacement of rotary pumps are diaphragm pumps
, employed as oil free. This allows
them to be used without added lubrication in contact with the air, so the compressed air
produced can be guaranteed clean.
11. Focus on densification mechanisms in sintering.
Sintering is a kinetic process that leads to the reduction of porosity in a material which
contains voids. In materials technology it is exploited to produce near-net-shape
components starting from materials in powder form.
Densification is a process which provides to increase density and strength of the
compacted powders, by reducing the pore space inside the material. The material
transport is essential in this process, essentially we deal with diffusional type (Surface,
Volume and GB diffusion). Pay attention that the redistribution of material over the
surface (by surface/volume diffusion) will not result in the shrinkage of the compact or in
the reduction of the pore space, they only increase the strength and reduce the sharp
pore contours. Densification occurs when the material is removed from the V between the
particle contact and it diffuse to close the pore.
There are 2 different stages for the sintering process, during the initial stage of sintering,
the neck grow and the radius increases during time with a power law, smaller particles
have a faster neck growth and larger neck radius, grain boundaries develop at the
contact regions, and the grain structure in the particles changes by grain growth or
recrystallization. The microstructure is then characterized by a continuous pore space
with grain boundaries located at the small cross sections of the solid. The decisive part of
shrinkage takes place during an intermediate stage, the second, where the individual
necks and powder particles grow together and cannot be clearly identified any longer.
The pore space then is still a continuous network embedded in a continuous solid. Grain
growth and pore shrinkage (resulting from diffusional mechanisms) are assumed to occur
simultaneously. In the very late stages of sintering (below 10% porosity), isolated and
geometrically well defined pores are present.
Breakaway of grain boundaries from the pores is usually the main obstacle to complete
densification. Local breakaway may result in exaggerated grain growth or secondary
recrystallization. The pressure allows lower temperatures than in pressure less sintering
to be employed, thus normal grain growth can be reduced and exaggerated grain growth,
caused by breakaway of grain boundaries from pores, may be avoided.
12. The effect of the energetic particles bombardment in deposition
process.
In many deposition processes the growing film is bombarded by energetic particles in this
way we have:
-Increased film density
-Modification or disruption of columnar microstructure
-Enhanced adhesion to the substrate
- Improvement in step coverage
But also negative aspects have to be considered:
- Creation of lattice defects (e.g. interstitials and vacancies)
- Increase in residual stress
13. Thermal barrier coating (TBC).
The TBC is usually used in the aerospace field above other coatings, as oxidation resistant
ones (MCrAlY). The most used now days is the Yttria stabilized zirconia one (ZrO2 at 8%)
8YSZ, because it shows a low density, low thermal conductivity, high melting point, good
thermal shock resistance and excellent erosion resistance.
The coating can be applied by plasma spray or EB-PVD. In the first case the coating
shows a lower mechanical strength and so a reduced erosion resistance, but a lower
initial thermal conductivity because of the presence of many voids and high porosity
inside the coating and we know that air gaps are good thermal insulator compared with
zirconia. While the TBC produced with EB-PVD is divided in two zone with different
microstructures: the inner zone is the early part of multiple nucleation and exhibits lower
thermal conductivity (around 1.0 W m-1 K-1). The outer part is characterized by a
columnar grain structure and its thermal conductivity approaches that of bulk zirconia. A
microstructure characterized by periodic interfaces and
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